UltraHighPurity
CMPslurry
PhotolithographyChemicals
UPWcirculation
ZeroParticleGeneration
Semiconductor Industry
Semiconductor Industry
Highly corrosive chemicals cause corrosion and metal contamination, requiring high-purity wetted parts.CMP slurries with abrasive particles can agglomerate and settle, requiring low-shear, wear-resistant pumps.Precise chemical dosing is critical, with dos
Key Challenges
Highly corrosive chemicals cause corrosion and metal contamination, requiring high-purity wetted parts.
CMP slurries with abrasive particles can agglomerate and settle, requiring low-shear, wear-resistant pumps.
Precise chemical dosing is critical, with dosing accuracy up to Β±0.5%.
Strict cleanliness requirements demand zero-leakage, low-extractables, and low-dead-leg designs.
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